
Wet N WildPhoto Focus FoundationIngredients
Wet N Wild Photo Focus Foundation is a product with 29 ingredients: Isododecane, Cyclopentasiloxane, Dimethicone, Glycerin, Cyclohexasiloxane, Water, Butylene Glycol, PEG-10 Dimethicone, Disteardimonium Hectorite, Adipic Acid/Neopentyl Glycol Crosspolymer and 19 more.
Contains: Antioxidant - Lecithin;
Organic score: 21% natural, 72% chemical.
Positive effects
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Dry skin
Positive: 2Negative: 0
Glycerin#4Butylene Glycol#7
Oily skin
Positive: 0Negative: 0
Sensitive skin
Positive: 0Negative: 0
Concerns
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Pore-clogging components - Butylene Glycol 7, Sorbitan Sesquioleate 14, Hexylene Glycol 22
Fungal acne supporting components - Sorbitan Sesquioleate 14, Hexyl Laurate 18
Silicones - Cyclopentasiloxane 2, Dimethicone 3
PEG - PEG-10 Dimethicone 8
Free from: Allergens, Drying alcohols, Chemical fragrances, Parabens, Sulfates, Gluten, Coconut, Petroleum-based,
INCI
1
Isododecane
Emollient, Fragrance ingredient, Solvent
2
Cyclopentasiloxane
Skin conditioning agent, Emollient, Hair conditioning, Solvent
3
Dimethicone
Skin conditioning agent, Antifoaming agent, Emollient
4
Glycerin
Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent
5
Cyclohexasiloxane
Skin conditioning agent, Emollient, Hair conditioning, Solvent
6
Water
Solvent
7
Butylene Glycol
Skin conditioning agent, Fragrance ingredient, Humectant, Masking, Solvent, Viscosity controlling agent
8
PEG-10 Dimethicone
Skin conditioning agent, Hair conditioning
Emollient
Fragrance ingredient
Solvent
Isododecane, Cyclopentasiloxane, Dimethicone, Glycerin, Cyclohexasiloxane, Water/Eau, Butylene Glycol, PEG-10 Dimethicone, Disteardimonium Hectorite, Adipic Acid/Neopentyl Glycol Crosspolymer, Sodium Chloride, Silica, Polysilicone -11, Sorbitan Sesquioleate, Lecithin, Polyglyceryl-4 Isostearate, Cetyl PEG/PPG-10/1 Dimethicone, Hexyl Laurate, Phenoxyethanol, Caprylyl Glycol, Potassium Sorbate, Hexylene Glycol, Laureth-12, Ethylhexylglycerin, Mica, Titanium Dioxide/Ci 77891, Iron Oxide/Ci 77491, Ci 77492, Ci 77499
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