PATTERNTreatment MaskIngredients

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PATTERN Treatment Mask is a product with 32 ingredients: Water, Polyquaternium-37, Saccharomyces/Rice Ferment Filtrate, Hydrolyzed Rice Protein, Butylene Glycol, Hibiscus Esculentus Seed Extract, Caesalpinia Spinosa Fruit Pod Extract, Moringa Oleifera Seed Extract, Helianthus Annuus (Sunflower) Sprout Extract, Sodium Benzoate and 22 more. Show all.

Contains: AHA - Citric Acid; Vitamins - Panthenol; Antioxidant - Citric Acid;

Organic score: 31% natural, 53% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

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Dry skin

Positive: 4Negative: 0

Butylene Glycol^#5Glycerin^#13Panthenol^#17Propylene Glycol^#21

Oily skin

Positive: 0Negative: 0

Sensitive skin

Positive: 0Negative: 4

Citric Acid^#12Isopropyl Alcohol^#20Limonene^#28Linalool^#31

Concerns

Pay attention to this information

Pore-clogging components - Butylene Glycol ⁵

Allergens - Limonene ²⁸, Geraniol ²⁹, Citronellol ³⁰, Linalool ³¹

Chemical fragrances - Fragrance ²⁷

Free from: Drying alcohols, Fungal acne supporting components, Parabens, Silicones, Sulfates, PEG, Gluten, Coconut, Petroleum-based,

INCI

Water

Solvent

Polyquaternium-37

Antistatic agent, Film former, Hair fixative

Saccharomyces/Rice Ferment Filtrate

Skin conditioning agent

Hydrolyzed Rice Protein

Skin conditioning agent, Antistatic agent, Hair conditioning

Butylene Glycol

Skin conditioning agent, Fragrance ingredient, Humectant, Masking, Solvent, Viscosity controlling agent

Hibiscus Esculentus Seed Extract

Skin conditioning agent

Caesalpinia Spinosa Fruit Pod Extract

Hair conditioning, Hair waving or straightening

Moringa Oleifera Seed Extract

Skin conditioning agent

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