M&S FormulaGentle Cleanse Exfoliating PolishIngredients

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M&S Formula Gentle Cleanse Exfoliating Polish is a product with 20 ingredients: Water, Glycerin, Perlite, Cetearyl Alcohol, Mineral Oil, Alumina, Caprylic/Capric Triglyceride, Dimethicone, Petrolatum, Phenoxyethanol and 10 more. Show all.

Contains: AHA - Citric Acid; Antioxidant - Citric Acid;

Organic score: 30% natural, 65% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

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Dry skin

Positive: 1Negative: 0

Glycerin^#2

Oily skin

Positive: 0Negative: 2

Petrolatum^#9Glyceryl Stearate SE^#11

Sensitive skin

Positive: 0Negative: 1

Citric Acid^#14

Concerns

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Pore-clogging components - Cetearyl Alcohol ⁴, Mineral Oil ⁵, Glyceryl Stearate SE ¹¹

Chemical fragrances - Fragrance ¹⁵

Fungal acne supporting components - PEG-100 Stearate ¹²

Silicones - Dimethicone ⁸

PEG - PEG-100 Stearate ¹²

Petroleum-based - Mineral Oil ⁵, Petrolatum ⁹

Free from: Allergens, Drying alcohols, Parabens, Sulfates, Gluten, Coconut,

INCI

Water

Solvent

Glycerin

Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent

Perlite

Abrasive, Bulking agent

Cetearyl Alcohol

Emollient, Emulsifying agent, Emulsion stabilizer, Foam booster, Surfactant, Viscosity controlling agent

Mineral Oil

Skin conditioning agent, Antistatic agent, Emollient, Fragrance ingredient, Hair conditioning, Solvent

Alumina

Abrasive, Anticaking agent, Bulking agent, Viscosity controlling agent

Caprylic/Capric Triglyceride

Skin conditioning agent, Fragrance ingredient

Dimethicone

Skin conditioning agent, Antifoaming agent, Emollient

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Compared With

Often compared with following products

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