HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica is a product with 48 ingredients. Contains:
- Antioxidant - Tocopherol, Glycyrrhiza Glabra (Licorice) Root Extract
Provides following positive effects: Softening, Moisturizing, Soothing, Hair conditioning, UV Protection and 14 more.
Organic score: 27% natural, 48% chemical.
Made by HAUS LABS.
INCI
1
Water
Solvent
2
Diphenylsiloxy Phenyl Trimethicone
Skin conditioning agent, Antifoaming agent, Hair conditioning
3
Phenyl Trimethicone
Skin conditioning agent, Antifoaming agent, Hair conditioning
4
Caprylyl Methicone
Skin conditioning agent
5
Trimethylsiloxysilicate
Skin conditioning agent, Antifoaming agent, Emollient
6
Propylene Glycol Dibenzoate
7
Isododecane
Emollient, Fragrance ingredient, Solvent
8
Glycerin
Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent
Ingredients by function
- Skin conditioning agent: Diphenylsiloxy Phenyl Trimethicone2, Phenyl Trimethicone3, Caprylyl Methicone4, Trimethylsiloxysilicate5, Butylene Glycol9 and 13 more.
- Antifoaming agent: Diphenylsiloxy Phenyl Trimethicone2, Phenyl Trimethicone3, Trimethylsiloxysilicate5, Alcohol Denatured14
- Hair conditioning: Diphenylsiloxy Phenyl Trimethicone2, Phenyl Trimethicone3, Glycerin8, Methyl Trimethicone10, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone11 and 4 more.
All the Positive
Find out what good effects the product has
Softening - 8 components:
Caprylyl Methicone4, Isododecane7, Glycerin8, Butylene Glycol9, Sorbitan Sesquioleate17, Squalane23, Glycyrrhiza Glabra (Licorice) Root Extract35, Ethylhexylglycerin40Moisturizing - 5 components:
Glycerin8, Butylene Glycol9, 1,2-Hexanediol19, Hydrolyzed Hyaluronic Acid22, Ethylhexylglycerin40Soothing - 3 components:
Arnica Montana21, Glycyrrhiza Glabra (Licorice) Root Extract35, Aluminum Hydroxide46Hair conditioning - 3 components:
Phenyl Trimethicone3, Trimethylsiloxysilicate5, Glycyrrhiza Glabra (Licorice) Root Extract35Concerns
Pay attention to these components
Risk of clogging pores
Butylene Glycol 9, Sorbitan Sesquioleate 17, Squalane 23, Tocopherol 30Risk of dryness
Alcohol Denatured 14Can support fungal acne
Sorbitan Sesquioleate 17
Silicones
Phenyl Trimethicone 3ECO Metrics
Find out how eco-friendly the components are
Vegan
No
Cruelty free
No
Reef friendly
Yes
Ozone layer safe
Yes
Components by Skin Type
Find out what components are good or bad for your skin type
Dry skin
Positive: 4Negative: 1
Glycerin#8Butylene Glycol#91,2-Hexanediol#19Tocopherol#30Alcohol Denatured#14
Oily skin
Positive: 0Negative: 0
Sensitive skin
Positive: 1Negative: 0
Titanium Dioxide#47
Detailed view
HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica
#1Water
Origin: natural
Role: Solvent
EWG Rating [ 1 ]
Water is a great solvent. It’s neutral and doesn’t provide any strong positive or negative effects. It just helps components to mix better and to transport active components.
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