HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica

HAUS LABSTriclone Skin Tech Medium Coverage Foundation With Fermented ArnicaIngredients

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HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica is a product with 48 ingredients: Water, Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone, Caprylyl Methicone, Trimethylsiloxysilicate, Propylene Glycol Dibenzoate, Isododecane, Glycerin, Butylene Glycol, Methyl Trimethicone and 38 more. Show all.

Contains: Antioxidant - Tocopherol, Glycyrrhiza Glabra (Licorice) Root Extract;

Organic score: 27% natural, 48% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

Find out what good effects the product has
Dry skin
Positive: 4Negative: 1
Glycerin#8Butylene Glycol#91,2-Hexanediol#19Tocopherol#30Alcohol Denatured#14
Oily skin
Positive: 0Negative: 0
Sensitive skin
Positive: 1Negative: 0
Titanium Dioxide#47

Concerns

Pay attention to this information
Pore-clogging components - Butylene Glycol 9, Sorbitan Sesquioleate 17, Squalane 23, Tocopherol 30
Drying alcohols - Alcohol Denatured 14
Fungal acne supporting components - Sorbitan Sesquioleate 17
Silicones - Phenyl Trimethicone 3
Free from: Allergens, Chemical fragrances, Parabens, Sulfates, PEG, Gluten, Coconut, Petroleum-based,

INCI

1
Water
Solvent
2
Diphenylsiloxy Phenyl Trimethicone
Skin conditioning agent, Antifoaming agent, Hair conditioning
3
Phenyl Trimethicone
Skin conditioning agent, Antifoaming agent, Hair conditioning
4
Caprylyl Methicone
Skin conditioning agent
5
Trimethylsiloxysilicate
Skin conditioning agent, Antifoaming agent, Emollient
6
Propylene Glycol Dibenzoate
7
Isododecane
Emollient, Fragrance ingredient, Solvent
8
Glycerin
Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent

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