Dupes for HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica

We have found 17 dupes for HAUS LABS Triclone Skin Tech Medium Coverage Foundation With Fermented Arnica in composition and properties. They also contain Water, Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone.

Total found: 17

Very similar product!
Same concentration of Water Position 1 vs. 1
Same concentration of Diphenylsiloxy Phenyl Trimethicone Position 2 vs. 2
Same concentration of Phenyl Trimethicone Position 3 vs. 3
Very similar product!
Same concentration of Water Position 1 vs. 1
Same concentration of Diphenylsiloxy Phenyl Trimethicone Position 2 vs. 2
Same concentration of Phenyl Trimethicone Position 3 vs. 3
Less Water Position 5 vs. 1
Much less Diphenylsiloxy Phenyl Trimethicone Position 11 vs. 2
Much less Phenyl Trimethicone Position 22 vs. 3
Same concentration of Water Position 1 vs. 1
Less Diphenylsiloxy Phenyl Trimethicone Position 4 vs. 2
Much less Phenyl Trimethicone Position 14 vs. 3
Same concentration of Water Position 1 vs. 1
Much less Diphenylsiloxy Phenyl Trimethicone Position 10 vs. 2
Much less Phenyl Trimethicone Position 13 vs. 3
Less Water Position 2 vs. 1
Slightly more Diphenylsiloxy Phenyl Trimethicone Position 1 vs. 2
Much less Phenyl Trimethicone Position 22 vs. 3
Much less Water Position 26 vs. 1
Much less Diphenylsiloxy Phenyl Trimethicone Position 10 vs. 2
Less Phenyl Trimethicone Position 4 vs. 3
Same concentration of Water Position 1 vs. 1
Same concentration of Diphenylsiloxy Phenyl Trimethicone Position 2 vs. 2
Less Phenyl Trimethicone Position 6 vs. 3
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