Be Plain Beplain Mung Bean Pore Clay Mask

Be PlainBeplain Mung Bean Pore Clay MaskIngredients

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Be Plain Beplain Mung Bean Pore Clay Mask is a product with 19 ingredients: Water, Kaolin, Dipropylene Glycol, Bentonite, Methyl Perfluorobutyl Ether, Methyl Perfluoroisobutyl Ether, Butylene Glycol, Glycerin, Phaseolus Radiatus Seed Extract, 1,2-Hexanediol and 9 more. Show all.

Organic score: 37% natural, 58% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

Find out what good effects the product has
Dry skin
Positive: 4Negative: 0
Butylene Glycol#7Glycerin#81,2-Hexanediol#10Allantoin#16
Oily skin
Positive: 1Negative: 1
Allantoin#16Glyceryl Stearate SE#12
Sensitive skin
Positive: 1Negative: 0
Allantoin#16

Concerns

Pay attention to this information
Pore-clogging components - Butylene Glycol 7, Glyceryl Stearate SE 12
Chemical fragrances - Fragrance 18
Fungal acne supporting components - PEG-100 Stearate 13
PEG - PEG-100 Stearate 13
Free from: Allergens, Drying alcohols, Parabens, Silicones, Sulfates, Gluten, Coconut, Petroleum-based,

INCI

1
Water
Solvent
2
Kaolin
Abrasive, Anticaking agent, Bulking agent
3
Dipropylene Glycol
Fragrance ingredient, Masking, Solvent, Viscosity controlling agent
4
Bentonite
Bulking agent, Emulsion stabilizer, Viscosity controlling agent
5
Methyl Perfluorobutyl Ether
Solvent, Viscosity controlling agent
6
Methyl Perfluoroisobutyl Ether
7
Butylene Glycol
Skin conditioning agent, Fragrance ingredient, Humectant, Masking, Solvent, Viscosity controlling agent
8
Glycerin
Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent
Abrasive
Anticaking agent
Water, Kaolin, Dipropylene Glycol, Bentonite, Methyl Perfluorobutyl Ether, Methyl Perfluoroisobutyl Ether, Butylene Glycol, Glycerin, Phaseolus Radiatus Seed Extract, 1,2-Hexanediol, Magnesium Aluminum Silicate, Glyceryl Stearate, PEG-100 Stearate, Xanthan Gum, Ethylhexylglycerin, Allantoin, Disodium EDTA, Fragrance, Phenoxyethanol

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