AnatomicalsAnti-Stress Face MaskIngredients

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Anatomicals Anti-Stress Face Mask is a product with 21 ingredients: Water, Talc, Kaolin, PEG-400, Caprylic/Capric Triglyceride, Glycerin, Bentonite, Glycerol Stearate, Ceteareth-20, PEG-100 Stearate and 11 more. Show all.

Organic score: 43% natural, 52% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

Find out what good effects the product has

Dry skin

Positive: 1Negative: 0

Glycerin^#6

Oily skin

Positive: 0Negative: 0

Sensitive skin

Positive: 0Negative: 0

Concerns

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Pore-clogging components - Talc ², Ceteareth-20 ⁹, Cetearyl Alcohol ¹¹

Chemical fragrances - Fragrance ¹²

Fungal acne supporting components - PEG-100 Stearate ¹⁰, Butyrospermum Parkii (Shea) Butter ¹⁶

PEG - PEG-400 ⁴, PEG-100 Stearate ¹⁰

Gluten - Hydrolyzed Oat Protein ¹³

Free from: Allergens, Drying alcohols, Parabens, Silicones, Sulfates, Coconut, Petroleum-based,

INCI

Water

Solvent

Talc

Abrasive, Anticaking agent, Bulking agent

Kaolin

Abrasive, Anticaking agent, Bulking agent

PEG-400

Binding, Emulsion stabilizer, Solvent

Caprylic/Capric Triglyceride

Skin conditioning agent, Fragrance ingredient

Glycerin

Fragrance ingredient, Hair conditioning, Humectant, Solvent, Viscosity controlling agent

Bentonite

Bulking agent, Emulsion stabilizer, Viscosity controlling agent

Glycerol Stearate

Solvent

Water¹, PEG-400⁴, Glycerin⁶

Abrasive

Talc², Kaolin³

Anticaking agent

Talc², Kaolin³

Aqua, Talc, Kaolin, PEG-400, Caprylic/Capric Triglyceride, Glycerin, Bentonite, Glycerol Stearate, Ceteareth-20, PEG-100 Stearate, Cetearyl Alcohol, Fragrance, Hydrolyzed Oat Protein, Phenoxyethanol, Caprylyl Glycol, Butyrospermum Parkii, Xanthan Gum, Vanillyl Butyl Ether, Ci 77499, Ci 77491, Ci 77492

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