Numa SkinHydrating & Relaxing Overnight MaskIngredients

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Numa Skin Hydrating & Relaxing Overnight Mask is a product with 32 ingredients: Water, Glycerin, Propanediol, Niacinamide, Rosa Damascena (Rose) Flower Water, Squalane, Pentylene Glycol, Steareth-2, 1,2-Hexanediol, Ammonium Acryloyldimethyltaurate/vp Copolymer and 22 more. Show all.

Contains: AHA - Citric Acid; Vitamins - Niacinamide, Panthenol, Tocopheryl Acetate; Antioxidant - Niacinamide, Tocopheryl Acetate, Citric Acid, Tocopherol;

Organic score: 28% natural, 50% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

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Moisturizing10

Glycerin ², Propanediol ³, Pentylene Glycol ⁷, 1,2-Hexanediol ⁹, Allantoin ¹⁶, Panthenol ¹⁸, Butylene Glycol ²¹, Hydrogenated Polyisobutene ²⁴, Sodium Hyaluronate ²⁶, Ethylhexylglycerin ²⁷

Softening9

Glycerin ², Squalane ⁶, Steareth-2 ⁸, Allantoin ¹⁶, Tocopheryl Acetate ¹⁹, Butylene Glycol ²¹, Cetyl Alcohol ²², Sodium Hyaluronate ²⁶, Ethylhexylglycerin ²⁷

Soothing4

Niacinamide ⁴, Allantoin ¹⁶, Panthenol ¹⁸, Citric Acid ²⁸

Hair conditioning4

Propanediol ³, Pentylene Glycol ⁷, Oryza Sativa (Rice) Extract ¹³, Panthenol ¹⁸

Anti-aging3

Niacinamide ⁴, Sodium Hyaluronate ²⁶, Tocopherol ³¹

Pore Shrinking2

Niacinamide ⁴, Allantoin ¹⁶

Dry skin

Positive: 7Negative: 0

Glycerin^#21,2-Hexanediol^#9Allantoin^#16Panthenol^#18Butylene Glycol^#21Sodium Hyaluronate^#26Tocopherol^#31

Oily skin

Positive: 1Negative: 0

Allantoin^#16

Sensitive skin

Positive: 1Negative: 1

Allantoin^#16Citric Acid^#28

Concerns

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Pore-clogging components 6: Squalane ⁶, Steareth-2 ⁸, Butylene Glycol ²¹, Cetyl Alcohol ²², Hydrogenated Polyisobutene ²⁴, Tocopherol ³¹

Silicones 1: Dimethicone ²³

Free from: Allergens, Drying alcohols, Chemical fragrances, Fungal acne supporting components, Parabens, Sulfates, PEG, Gluten, Coconut, Petroleum-based,