Dupes for Oskia Renaissance Mask

We have found 2 dupes for Oskia Renaissance Mask in composition and properties. They also contain Glycerin, Cetearyl Olivate, Dimethyl Sulfone.

COSRX

AC Collection Ultimate Spot Cream

24 components

Less Glycerin Position 4 vs. 1

Much less Cetearyl Olivate Position 12 vs. 3

Less Dimethyl Sulfone Position 7 vs. 4

Eclado Laboratory

A.C Centella Mask

34 components

Less Glycerin Position 5 vs. 1

Much less Cetearyl Olivate Position 25 vs. 3

Same concentration of Dimethyl Sulfone Position 4 vs. 4

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