Indie LeeClearing MaskIngredients

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Indie Lee Clearing Mask is a product with 17 ingredients: Water, Bentonite, Zinc Oxide, Sulfur, Propanediol, Glycolic Acid, Salicylic Acid, Hyaluronic Acid, Camphor, Cetyl Alcohol and 7 more. Show all.

Contains: AHA - Glycolic Acid; BHA - Salicylic Acid;

Organic score: 47% natural, 53% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

Find out what good effects the product has

Dry skin

Positive: 0Negative: 0

Oily skin

Positive: 4Negative: 2

Zinc Oxide^#3Glycolic Acid^#6Salicylic Acid^#7Camphor^#9Glyceryl Stearate SE^#11Chondrus Crispus (Carrageenan) Extract^#12

Sensitive skin

Positive: 2Negative: 3

Zinc Oxide^#3Titanium Dioxide^#14Glycolic Acid^#6Salicylic Acid^#7Limonene^#15

Concerns

Pay attention to this information

Pore-clogging components - Zinc Oxide ³, Cetyl Alcohol ¹⁰, Glyceryl Stearate SE ¹¹

Allergens - Limonene ¹⁵

Free from: Drying alcohols, Chemical fragrances, Fungal acne supporting components, Parabens, Silicones, Sulfates, PEG, Gluten, Coconut, Petroleum-based,

INCI

Water

Solvent

Bentonite

Bulking agent, Emulsion stabilizer, Viscosity controlling agent

Zinc Oxide

Bulking agent, Colorant

Sulfur

Skin conditioning agent, Antiacne agent, Antidandruff agent, Antiseborrhoeic, Antistatic agent, Hair conditioning

Propanediol

Solvent, Viscosity controlling agent

Glycolic Acid

AHA

Buffering agent, Exfoliant

Salicylic Acid

BHA

Skin conditioning agent, Antiacne agent, Antidandruff agent, Exfoliant, Fragrance ingredient, Hair conditioning, Keratolytic, Masking, Preservative

Hyaluronic Acid

Skin conditioning agent, Antistatic agent, Humectant, Moisturising, Viscosity controlling agent

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