Dupes for HAUS LABS Triclone Skin Tech Hydrating + De-puffing Concealer

We have found 2 dupes for HAUS LABS Triclone Skin Tech Hydrating + De-puffing Concealer in composition and properties. They also contain , Glycerin, Diphenylsiloxy Phenyl Trimethicone, Trimethylsiloxysilicate.

Total found: 2

Much less Glycerin Position 11 vs. 2
Less Diphenylsiloxy Phenyl Trimethicone Position 5 vs. 3
Less Trimethylsiloxysilicate Position 6 vs. 4
Much less Glycerin Position 16 vs. 2
Much less Diphenylsiloxy Phenyl Trimethicone Position 21 vs. 3
Much less Trimethylsiloxysilicate Position 23 vs. 4
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