Dupes for HAUS LABS Triclone Skin Tech Hydrating + De-puffing Concealer

We have found 3 dupes for HAUS LABS Triclone Skin Tech Hydrating + De-puffing Concealer in composition and properties. They also contain Water, Glycerin, Diphenylsiloxy Phenyl Trimethicone.

Total found: 3

Much less Water Position 25 vs. 1
Much less Glycerin Position 11 vs. 2
Less Diphenylsiloxy Phenyl Trimethicone Position 5 vs. 3
Much less Water Position 19 vs. 1
Much less Glycerin Position 15 vs. 2
Less Diphenylsiloxy Phenyl Trimethicone Position 7 vs. 3
Much less Water Position 19 vs. 1
Much less Glycerin Position 17 vs. 2
Same concentration of Diphenylsiloxy Phenyl Trimethicone Position 3 vs. 3
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