Hada LaboAHA+BHA Mild Peeling Lotion (MY)Ingredients

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Hada Labo AHA+BHA Mild Peeling Lotion (MY) is a product with 8 ingredients: Water, Gluconic Acid, Pentylene Glycol, Butylene Glycol, Tranexamic Acid, Polyquaternium-51, Sodium Metabisulfite, Phenoxyethanol.

Organic score: 13% natural, 75% chemical. Vegan - No; Cruelty free - No; Reef friendly - Yes;

Positive effects

Find out what good effects the product has

Dry skin

Positive: 1Negative: 0

Butylene Glycol^#4

Oily skin

Positive: 0Negative: 0

Sensitive skin

Positive: 0Negative: 0

Concerns

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Pore-clogging components - Butylene Glycol ⁴

Free from: Allergens, Drying alcohols, Chemical fragrances, Fungal acne supporting components, Parabens, Silicones, Sulfates, PEG, Gluten, Coconut, Petroleum-based,

INCI

Water

Solvent

Gluconic Acid

Buffering agent, Chelating agent, Fragrance ingredient, Humectant, Solvent

Pentylene Glycol

Skin conditioning agent, Solvent

Butylene Glycol

Skin conditioning agent, Fragrance ingredient, Humectant, Masking, Solvent, Viscosity controlling agent

Tranexamic Acid

Skin conditioning agent, Astringent

Polyquaternium-51

Skin conditioning agent, Film former, Humectant

Sodium Metabisulfite

Preservative

Phenoxyethanol

Fragrance ingredient, Preservative

Solvent

Water¹, Gluconic Acid², Pentylene Glycol³, Butylene Glycol⁴

Buffering agent

Gluconic Acid²

Chelating agent

Gluconic Acid²

Water, Gluconic Acid, Pentylene Glycol, Butylene Glycol, Tranexamic Acid, Polyquaternium-51, Sodium Metabisulfite, Phenoxyethanol

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Compared With

Often compared with following products

COSRX

AHA/BHA Clarifying Treatment Toner

See comparison